Walter Ng, senior director of platform alliances at Chartered Semiconductor Manufacturing noted in his presentation at the SPIE Advanced Lithography Conference last week that while there are some good point tools for DFM, integrated DFM solutions are still lacking.
As I noted in an earlier post, Why can’t we do it in EDA?, it is a huge task for a single vendor to handle even most of the important sources of variations through a single integrated flow. Integration of point tools requires standardization as well as agreement over interfaces and formats.
IBM’s Leon Stok had identified 4 eras in the EDA industry. For the 4th era i.e. design implementation platforms, he mentioned that we would need to define standards as APIs in order to allow tools to talk to each other.
The trend is moving more and more towards a hybrid approach
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